1. Delivered an invited talk on “High energy density pinch plasma- a unique tool for plasma processing and deposition” UGC Sponsored National Seminar on “Recent advances in material science and their applications” held at BN College, Dhubri, Assam 24-25 March 2017.

2.Delivered invited talk in International Conference on Plasma Science and Applications 2013 (ICPSA2013) 4-6 Dec 2013, NIE Singapore, Session 4(b).

3. Studies on charged particle emission from plasma focus device and their application in material modifications, International Workshop on Plasma Science and Applications (IWPSA-2010), 25-26 October 2010, Xiamen, China.

4. EUV diagnostics of pulsed plasma system, International Workshop on Plasma Diagnostics and Application (IWPDA-2009), 2-3 July 2009, NIE, Singapore.

5. Discharge produced plasma EUV lithography source, Department of Electric and Electronic Systems, University of Toyama, Japan, on 28.05.2009.

6. Plasma Focus: A multiple radiation source for various applications, Prof. Masugata Laboratory meeting, Department of Electric and Electronic Systems, University of Toyama, Japan, on 07.05.2009.

7. EUV diagnostics of pulsed plasma systems, 23rd National Symposium on Plasma Science and Technology, BARC, Mumbai, Dec.10-13, 2008.

8. Experimental research activities of Centre of Plasma Physics, Department of Energy Science, Tokyo Institute of Technology, Yokohama, Japan, 19th Oct. 2007.

9. Discharge produced plasma source for EUV lithography, Physics Department, Stewart science College, Cuttack, Orissa, 28th July 2007.

10. Discharge produced plasma source for EUV Lithography, Institute for Plasma Research, Gandhinagar, 7th June 2007.

11. Pinch Plasma Research at Centre of Plasma Phyics, Department of Electrical Engineering, Toyama University, Japan, June 14, 2005.

12. Plasma Focus Research at Centre of Plasma Phyics, Department of Energy Science, Tokyo Institute of Technology, Yokohama, Japan, 2nd February, 2005.

13. EUV source based on fast capillary plasma, NIE-AAAPT expert meeting, National Institute of Education (NIE), Nanyang Technological University, Singapore, 21-22 August, 2004.

14. Recent progresses of EUV source development work at GREMI, GREMI, Universite d’Orleans, France, Oct.2001.

15. Studies on Dense Plasma Focus and its application, Department of Energy Science, Tokyo Institute of Technology, Yokohama, Japan, June 2000.

16. Dense Plasma Focus, it's associate phenomena and applications, Institute of Material Science, Bhubaneswar, 14th January 1999.