1. Irradiation effects in graphite induced by helium ions: surface, structural, and chemical analyses, S.R. Mohanty, N.J. Dutta, N. Buzarbaruah, M. Ranjan, and R.S. Rawat, Oral talk, The 45th IEEE International Conference on Plasma Sciences (ICOPS-2018), Denver, US, June 24-28, 2018.

2. Ion irradiation on graphite to study its structural and morphological changes: N.J. Dutta, N. Buzarbaruah, S.R. Mohanty, International Conference on Material Science (ICMS) Tripura University (14th-16th Feb. 2013), India.

3. Damage studies on tungsten due to helium ion irradiation: N. Buzarbaruah, N.J. Dutta, S.R. Mohanty, International Conference on Material Science (ICMS) Tripura University (14th-16th Feb. 2013), India.

4. Features of X-ray emission from a plasma focus device, N.K. Neog, S.R. Mohanty, and T.K. Borthakur, 6th Conference of Asia Plasma & Fusion Association, 3-5, Dec.2007, Gandhinagar, India.

5. Development of a Gas Jet-Type Z pinch EUV Light Source for Lithography, N. Iizuka, N. Kishi, S.R. Mohanty, M. Watanabe, A. Okino, T. Kawamura, K. Horioka and E. Hotta, Presented in International Symposium on Extreme Ultraviolet Lithography, Oct. 2006, Barcelona.

6. Optimization of a gas jet-type Z-pinch discharge EUV light source, N. Iizuka, N. Kishi, I. Song, T. Sakamoto, Y. Kobayashi, S. R. Mohanty, M. Watanabe, A. Okino and E. Hotta, Proc. 22nd International Symposium on Discharges and Electrical Insulation in Vacuum, Matsue, Japan, September 25-29, 2006, Vol.2, pp.630-633 (2006).

7. Current Control for efficient Z-pinch EUV light source, K. Horioka, E. Hotta, A. Okino, T. Kawamura, M. Nakajima, M. Watanabe, M. Masnavi, S.R. Mohanty, S. Inho, A. Kikuchi, K. Takahashi, International Symposium on Extreme Ultraviolet Lithography, 7-9 Nov.2005, San Diego, USA.

8. Development of a gas jet type Z-pinch EUV light source, E. Hotta, K. Horioka, A. Okino, T. Kawamura, M. Watanabe, M. Masnavi, S.R. Mohanty, S. Inho, T. Sakamoto and Y. Kobayashi, International Symposium on Extreme Ultraviolet Lithography, 7-9 Nov.2005, San Diego, USA.

9. Performance of a gas jet type Z-pinch EUV light source, I. Song, Y. Kobayashi, T. Sakamoto, S.R. Mohanty, M. Watanabe, A. Okino, T. Kawamura, K. Yasuoka, K. Horioka and E. Hotta, 31st International Conference on Micro- and Nano- Engineering, 19-22 Sept.2005, Viena.

10. Development of gas jet type Z-pinch extreme ultraviolet light source for next generation lithography, Inho Song, Yusuke Honma, Kazuhiro Iwata, S.R. Mohanty, Masato Watanabe, Toru Kawamura, Akitoshi Okino, Koichi Yasuoka, Kazuhiko Horioka and Eiki Hotta, NIFS-PROC-61, p-23 (2005).

11. Emission spectroscopy investigation of time resolved ZrO2 and Al2O3 plasma characteristics, A.D.Handoko, P.S. Lee, R.S. Rawat, C.K. P. Lee, S.R. Mohanty, Symposium Y, 3-8 July 2005, Singapore.

12. Comparative study on optical performance of xenon capillary Z-pinch EUV lithography light source, I. Song, T. Sakamoto, Y. Kobayashi, S.R. Mohanty, M. Watanabe, A. Okino, T. Kawamura, K. Horioka and E. Hotta, Spectra Asia 2005, Tokyo.

13. Optical Emission Spectroscopy to Study FeCo Thin Film Deposition Using Plasma Focus, T.Zhang, S.R.Mohanty, S.M.Hassan, A.Patran, T.L.Tan, S.V.Springham, P.Lee and S.R.Rawat, AIP Conference Proceedings, Vol.808, pp 231-4 (2006).

14. Extreme ultraviolet light emission from Z-pinch discharge plasma source, M. Watanabe, I. Song, T. Sakamoto, Y. Kobayashi, A. Okino, S.R. Mohanty, K. Horioka and E. Hotta, AIP Conference Proceedings, Vol.808, pp 267-70 (2006).

15. High quality EUV production from discharge produced plasma, M. Watanabe, I. Song, T. Sakamoto, Y. Kobayashi, A. Okino, S.R. Mohanty, K. Horioka and E. Hotta, 32nd IEEE International Conference on Plasma Science, Monterey, CA, June 18-23, 2005.

16. Development of gas jet Z pinch EUV light source for lithography, Inho Song, Kazuhiro Iwata, Yusuke Honma, S.R. Mohanty, Masato Watanabe, Toru Kawamura, Akitoshi Okino, Koichi Yasuoka, Kazuhiko Horioka and Eiki Hotta, 15th IEEE International Pulsed Power Conference, Monterey, CA, June 13-17, 2005.

17. Study on optical characteristics of EUV source for semiconductor lithography, K. Iwata, Y. Honma, I.H. Song, M. Masnavi, S.R. Mohanty, M. Watanabe, A. Okino, K. Yasuoka, K. Horioka and Eiki Hotta, IEEJ Annual Conference,I-178, p-244 (2005).

18. A fast capillary discharge plasma dedicated to EUV radiation production-possible source for EUV lithography C. Fleurier, T. Gonthiez, E. Robert, S.R. Mohanty, O. Sarroukh, R. Viladrosa, J.M. Pouvesle, C. Cachoncinlle, Conference record of Twenty-Fifth International Power Modulator Symposium and 2002 High-Voltage Workshop (Cat. No.02CH37381), 2002, p 587-90.

19. Spectroscopic and energetic investigation of capillary discharges devoted to EUV production for new lithography generation, E. Robert, B. Blagojevic, R. Dussart, S.R. Mohanty, M.M. Idrissi, D.Hong, R. Viladrosa, J.M. Pouvesle, C. Fleurier and C. Cachoncinlle, in Proceeding of SPIE, vol. 4343, 566-575 (2001).

20. Potentiality of Z-discharge plasma as a source of coherent soft X-rays, Kazuhiko Horioka, Mitsuo Nakajima, Tomonao Hosokai, Gohta Niimi, S.R. Mohanty and Eiki Hotta, Source 2000, July 3-4, 2000, Tokyo Institute of Technology, O- okayam, Japan.

21. Dynamics and X-ray radiation process of capillary Z-pinch discharge plasma, Gohta Niimi, S.R. Mohanty, Mitsuo Nakajima, Akitoshi Okino, Masato Watanabe, Kazuhiko Horioka and Eiki Hotta, in IEEJ meeting on Plasma Sciences, 14-15 June, 2000, Akita, Japan.

22. Dense Plasma Sequential Focus Device, S.R. Mohanty, R.S. Rawat, and M.P. Srivastava, Dense Plasma Sequential Focus Device, International Meeting on Frontiers of Physics, Kuala Lumpur, Malaysia, Oct 25-29, 1998.

23. Laser shadowgraphic study of plasma sheath in dense plasma focus in the presence of external axial magnetic field, R.S. Rawat, M.P. Srivastava and S.R. Mohanty, Int. Conf. on Plasma Physics, Innsbruck, 29th June - 3rd July, 1992, pt.II, pp. 1195-1198.

24. Spectral analysis of focussed plasmas; C.S. Wong, S.P. Moo, M. Han, Z.M. Jiang, S.R. Mohanty and C. Silawatshananai, 5th Asia Pacific Physics Conf., 10-15 Aug., 1992, Kuala Lumpur, vol.1, pp. 626-629.